it is one manner for depositing extremely controlled thin films.

Question: it is one manner for depositing extremely controlled thin films.

Atomic layer deposition (ALD) is a technique for depositing thin films with precise control over thickness and composition. ALD works by exposing a substrate to alternating pulses of two or more precursor gases that react on the surface, forming a layer of material one atomic layer at a time. The process is self-limiting, meaning that the film growth stops once the surface is fully saturated with the precursor. ALD is widely used in microelectronics, optics, energy, and other fields where precise and uniform thin films are required.